%0 journal article
%@ 0026-3672
%A Weiss, C., Knoth, J., Schwenke, H., Geisler, H., Lerche, J., Schulz, R., Ullrich, H.-J.

%D 2000
%J Mikrochimica Acta
%N 1-4
%P 65-68 

%T Potential of Total Reflection and Grazing Incidence XRF for Contamination and Process Control in Semiconductor Fabrication
%U 
1-4 
%X