%0 journal article
%@ 0255-5476
%A Martins, R.M.S., Schell, N., Reuther, H., Pereira, L., Silva, R.J.C., Mahesh, K.K., Braz Fernandes, F.M.

%D 2008
%J Materials Science Forum, Advanced Materials Forum IV

%P 672-676 
%R doi:10.4028/www.scientific.net/MSF.587-588.672
%T Characterization of Ni-Ti (Shape memory alloy) thin film by in-situ XRD and complementary ex-situ techniques
%U https://doi.org/10.4028/www.scientific.net/MSF.587-588.672
 
%X Ti2Ni. The evolution of the lattice parameter values of the B2 phase, calculated from the corresponding XRD data, is clearly linked with the increase of the Ti power. The depth profile of the atomic concentrations determined by Auger Electron Spectroscopy (AES) is in agreement with the in situ XRD results. The temperature dependence of the electrical resistivity was used to monitor phase transformations, Scanning Electron Microscopy (SEM) has shown the presence of twinned martensite on the film’s surface at room temperature.