@misc{martins_the_interfacial_2008, 
author={Martins, R.M.S., Schell, N., Beckers, M., Muecklich, A., Reuther, H., Silva, R.J.C., Mahesh, K.K., Braz Fernandes, F.M.},
title={The interfacial diffusion zone in magnetron sputtered Ni-Ti thin films deposited on different Si substrates studied by HR-TEM},
year={2008},
howpublished = {journal article},
doi = {https://doi.org/10.4028/www.scientific.net/MSF.587-588.820},
abstract = {of the diffusion interface is strongly dependent on the type of substrates.},
note = {Online available at: \url{https://doi.org/10.4028/www.scientific.net/MSF.587-588.820} (DOI). Martins, R.; Schell, N.; Beckers, M.; Muecklich, A.; Reuther, H.; Silva, R.; Mahesh, K.; Braz Fernandes, F.: The interfacial diffusion zone in magnetron sputtered Ni-Ti thin films deposited on different Si substrates studied by HR-TEM. Materials Science Forum, Advanced Materials Forum IV. 2008. vol. 587-588, 820-823. DOI: 10.4028/www.scientific.net/MSF.587-588.820}}