Determination of metallic impurities in the surface of silicon wafers by total reflection x-ray fluorescence analysis
No abstract available.
URL: https://publications.hereon.de/id/15519/
Authors:Schwenke, H., Knoth, J., Weisbrod, U.
Year:1988
In: The Pittsburgh Conference + Exposition
Location:New Orleans, LA (USA)
Date:22.-26.02.1988
Cite as: Schwenke, H.; Knoth, J.; Weisbrod, U.: Determination of metallic impurities in the surface of silicon wafers by total reflection x-ray fluorescence analysis. In: The Pittsburgh Conference + Exposition. New Orleans, LA (USA), 22.-26.02.1988, 1988.
