Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces

Inbook

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URL: https://publications.hzg.de/id/17762/
Authors:Eichinger, P., Rath, H. J., Schwenke, H.
Year:1989
In: ASTM Special Technical Publicaton
Volume:990
Pages: 305-313
Publisher:ASTM, Philadelphia
Type:Inbook
Cite as: Eichinger, P.; Rath, H. J.; Schwenke, H.: Application of total reflection X-ray fluorescence analysis for metallic trace impurities on silicon wafer surfaces. In: ASTM Special Technical Publicaton. Vol. 990 Philadelphia: ASTM, 1989. 305-313.